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Proceso de grabado seco de silicio monocristalino para aplicaciones en guías de onda coplanares

In this work, the anisotropic etching and the use of silicon rich oxide (SRO) are studied in order to improve the waveguide coplanar (CPW). Experimental results of dry etching of mono-crystalline silicon for application in CPW’s using RIE/ICP reactor are presented. The contribution of the physical a...

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Bibliographic Details
Main Authors: REBECA LEAL ROMERO, IGNACIO ENRIQUE ZALDIVAR HUERTA, J. Apolinar Reynoso Hernández, CLAUDIA REYES BETANZO, María del Carmen Maya Sánchez, MARIANO ACEVES MIJARES
Format: info:eu-repo/semantics/article
Language:spa
Published: Revista Mexicana de Física 2010
Subjects:
info:eu-repo/classification/Mono-crystalline silicon/Mono-crystalline silicon
info:eu-repo/classification/Coplanar waveguide (CPW)/Coplanar waveguide (CPW)
info:eu-repo/classification/Dry etching/Dry etching
info:eu-repo/classification/SRO/SRO
info:eu-repo/classification/Silicio monocristalino/Silicio monocristalino
info:eu-repo/classification/Guía de onda coplanar (CPW)/Guía de onda coplanar (CPW)
info:eu-repo/classification/Grabado seco/Grabado seco
info:eu-repo/classification/cti/1
info:eu-repo/classification/cti/22
info:eu-repo/classification/cti/2203
Online Access:http://inaoe.repositorioinstitucional.mx/jspui/handle/1009/1553

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http://inaoe.repositorioinstitucional.mx/jspui/handle/1009/1553

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