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182by Marwan, J., McKubre, M. C. H., Tanzella, F. L., Hagelstein, Peter L., Miles, M. H., Swartz, M. R., Storms, Edmund, Iwamura, Y., Mosier-Boss, P. A., Forsley, L. P. G.Get full text
Published 2012
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188by Kim, D.-H., Li, J., Kuo, J.-M., Pinsukanjana, P., Kao, Y.-C., Chen, P., Papavasiliou, A., King, C., Regan, E., Urteaga, M., Brar, B., Kim, T.-W., del Alamo, Jesus A., Antoniadis, Dimitri A.“...-epitaxy (MBE) 1-nm InP layer and is fabricated through a triple-recess process. An L[subscript g] = 60 nm...”
Published 2014
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